This antistatic agent is used to prevent electrons from accumulating on the resist surface during electron beam lithography.
This material is used in advanced photomask manufacturing to help prevent charge-up failures.

Inquiries

Inquiries Concerning Products


Mitsubishi Chemical Corporation
Marketing Group 2, Semiconductor Materials Dept.
  • TEL:[+81]-3-6748-7168

View the products of Semiconductor Materials Unit, Mitsubishi Chemical[Open in a new window]