This photosensitive polymer for photo resists is used during the formation of semiconductor circuits.
This material is designed to satisfy strict quality requirements, such as high purity and low metal content, associated with the miniaturization of circuit patterns.
Our services include polymer design, prototyping, and mass production.


Inquiries Concerning Products

Mitsubishi Chemical Corporation
Marketing Group 2, Semiconductor Materials Dept.
  • TEL:[+81]-3-6748-7168

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