In recent years, the demand is increasing for high quality removal of metals from small size semiconductor circuits during silicon wafer cleaning process. Star Series meets this demand with semiconductor process chemicals having metal impurity levels below 10ppt.

Products: Hydrochloric acid

Inquiries

Characteristics

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In order to achieve ultra-high purity with the semiconductor wafer free from inorganic and organic residues, the following property is required;

  • Removal of metal residues

Our chemical products meet this requirement and provide high performance for the semiconductor and  flat panel industries.

Lineup

  • Hydrochloric acid

Four features of Star Series

  1. 1.Providing high-quality products for over 30 years
  2. 2.Improving quality in collaboration with major semiconductor companies
  3. 3.Adaptation to miniaturization of semiconductor circuits
  4. 4.High-performance quality control in comprehensive chemical company

Developed with these principles, Star Series provides the ability to reduce metal impurities below 10ppt.
We are continuing to develop and improve high-purity chemicals to support the advancing miniaturization of semiconductor processors.

Applications

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Silicon wafer cleaning during semiconductor processing

Inquiries Concerning Products

Mitsubishi Chemical Corporation
Semiconductor Materials Dept.

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