Products: Nitric acid, Ammonia solution, Hydrogen peroxide
In order to achieve ultra-high purity with the semiconductor wafer free from inorganic and organic residues, the following properties are required;
- 1.Particle removal
- 2.Removal of organic residues
- 3.Removal of metal residues
Our chemical products meet those requirements and provide high performance for the semiconductor and flat panel industries.
- Hydrochloric acid
- Nitric acid
- Ammonia solution
Four features of Star Series
- 1.Providing high-quality products for over 30 years
- 2.Improving quality in collaboration with major semiconductor companies
- 3.Adaptation to miniaturization of semiconductor circuits
- 4.High-performance quality control in comprehensive chemical company
Developed with these principles, Star Series provides the ability to reduce metal impurities below 10ppt.
We are continuing to develop and improve high-purity chemicals to support the advancing miniaturization of semiconductor processors.
Silicon wafer cleaning during semiconductor processing