Advanced Cleaning SolutionsAdvanced Cleaning Solution for RCA Process, "MC1"
Mitsubishi Chemical CorporationCharacteristics
[Close]
MC1 is an electronics chemical that is used as a high-performance alternative RCA clean for silicon wafers and the like. It has the capability to remove both particles and metals.
MC1 is an electronic chemical which can remove both particles and metal impurities from the wafer surface. That is, it can simultaneously perform two RCA clean functions, namely the SC-1 clean`s particle removal and the SC-2 clean`s metal impurity removal.
As a result, cross contamination is eliminated, the number of RCA clean steps is reduced, and the cleaning solution lifetime is extended. Therefore a reduction in total processing cost can be achieved.
- Reduction of metal contamination
- Prevention of cross contamination
Applications
[Close]
Alternative RCA cleaning solution
Inquiries Concerning Products
View the products of Semiconductor Materials Dept., Mitsubishi Chemical[Open in a new window]